专题:Plasma Diagnostics and Applications

This cluster of papers covers a wide range of topics related to plasma physics and its applications in the semiconductor industry, including plasma etching techniques, atomic layer etching, Hall thrusters for spacecraft propulsion, electron energy distribution function measurements, and ion-molecule collisions. It also explores the use of plasmas in electric propulsion for satellites and spacecraft.
最新文献
Ultra‐High‐Efficiency On‐Chip CO 2 Conversion by Nanosecond Self‐Pulsing Micro‐Plasma Devices

article Full Text OpenAlex

Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching of SiO2 with high repeatability of cycles in industrial ICP reactor. II. Simulation

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In situ analysis of SiO2 films etched under cryogenic conditions using H2/F2/Ar gas mixture plasma

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An ionisation region model of reactive high-power impulse magnetron sputtering of Ti in an Ar/N 2 atmosphere

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Secondary Electron Emission and Trap State In Situ Combined (SETiC) Measurement for Spacecraft ESD Protection

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Plume Characterization in a Very Low Earth Orbit Wind Tunnel

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Is it possible to dynamical monitoring the products of silane conversion in plasma with non-local characteristics using probe diagnostics?

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Absolute Spectral Intensities From Near-Surface Measurements in Air Plasma

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Neutral-beam etching with high selectivity and low damage for GaN-based materials

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Review of plasma thruster technology development for air-breathing electric propulsion missions

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近5年高被引文献
The 2022 Plasma Roadmap: low temperature plasma science and technology

article Full Text OpenAlex 484 FWCI41.1829

A state-of-the-art review on the multifunctional self-cleaning nanostructured coatings for PV panels, CSP mirrors and related solar devices

review Full Text OpenAlex 153 FWCI11.447

Physics of plasma jets and interaction with surfaces: review on modelling and experiments

article Full Text OpenAlex 133 FWCI11.5179

Thermal runaway and jet flame features of LIBs undergone high-rate charge/discharge: An investigation

article Full Text OpenAlex 120 FWCI25.8982

Nanosecond pulsed plasma assisted combustion of ammonia-air mixtures: Effects on ignition delays and NOx emission

article Full Text OpenAlex 118 FWCI16.4256

Modelling and Simulation of Single Dielectric Barrier Discharge Plasma Actuators

article Full Text OpenAlex 117 FWCI1.0015

Plasma-Activated Water: Physicochemical Properties, Generation Techniques, and Applications

article Full Text OpenAlex 113 FWCI26.382

Current Advancements in the Molecular Mechanism of Plasma Treatment for Seed Germination and Plant Growth

review Full Text OpenAlex 112 FWCI14.8407

Future of plasma etching for microelectronics: Challenges and opportunities

article Full Text OpenAlex 110 FWCI23.74

Catalyst-free single-step plasma reforming of CH4 and CO2 to higher value oxygenates under ambient conditions

article Full Text OpenAlex 107 FWCI14.987