专题：Advancements in Photolithography Techniques

This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.
最新文献
Dual-stream perception cross-flattening transformer for few-shot surface defect detection

article Full Text OpenAlex

Overlay detection for multiple nanoimprint lithography in optical microscopic fields of view using Mie resonator arrays

article Full Text OpenAlex

Deep-reactive-ion-etching in X-ray grating fabrication: a review

article Full Text OpenAlex

Mirrored in-situ consolidation of CF/PEEK composite parts using a pixelated mirror heating tool

article Full Text OpenAlex

AWQ: Activation-aware Weight Quantization for On-Device LLM Compression and Acceleration

article Full Text OpenAlex

Decision letter for "Analysis of EUV Induced Depolymerization of Polyphthalaldehydes and Side Reactions for Dry Develop EUV Resist Applications"

peer-review Full Text OpenAlex

Review for "“The 250 mV Barrier”: A Thermodynamic Ceiling That Every OER/ORR Researcher Must Know!"

peer-review Full Text OpenAlex

In Vitro Characterization of a Cyclosporine Eluted Polymeric Stent Manufactured by Liquid Crystal Display 3D Technology

article Full Text OpenAlex

13.6 A Via-Programmable DNN-Processor Fabrication Toward 1/40th Mask Cost

article Full Text OpenAlex

Single Image Estimation Techniques for SEM Imaging System

article Full Text OpenAlex

近5年高被引文献
Defect and Diffusion Forum

paratext Full Text OpenAlex 544 FWCI0

Evolution in Lithography Techniques: Microlithography to Nanolithography

review Full Text OpenAlex 208 FWCI21.52934406

Binding energy referencing in X-ray photoelectron spectroscopy

review Full Text OpenAlex 170 FWCI51.00669376

Trends in photoresist materials for extreme ultraviolet lithography: A review

review Full Text OpenAlex 156 FWCI25.87788811

High-NA EUV lithography: current status and outlook for the future

article Full Text OpenAlex 149 FWCI15.9317146

AWQ: Activation-aware Weight Quantization for On-Device LLM Compression and Acceleration

article Full Text OpenAlex 117 FWCI529.84821138

Advances in machine learning and deep learning applications towards wafer map defect recognition and classification: a review

review Full Text OpenAlex 94 FWCI14.74642876

DIC Challenge 2.0: Developing Images and Guidelines for Evaluating Accuracy and Resolution of 2D Analyses

article Full Text OpenAlex 85 FWCI10.02713589

Recent developments in photoresists for extreme-ultraviolet lithography

article Full Text OpenAlex 79 FWCI13.10482795

Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms

article Full Text OpenAlex 75 FWCI12.44129236