专题：Advancements in Photolithography Techniques

This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.
最新文献
WATOS: Efficient LLM Training Strategies and Architecture Co-Exploration for Wafer-Scale Chip

article Full Text OpenAlex

Operational Specification: Blueprint 2026 TCF/TFB

article Full Text OpenAlex

Effect of molecular layer deposition parameters on the electron beam resist properties of hafnicone hybrid films

article Full Text OpenAlex

EUV Lithography: There is Still Much to Do

article Full Text OpenAlex

A hierarchical adaptive particle swarm optimizer with diversity maintenance for suppressing edge distortion in DMD lithography

article Full Text OpenAlex

Ligand Functionality-Dependent Performance of Organotin Carboxylate Resists

article Full Text OpenAlex

Photopharmacology in Action: Conformational Landscape of a Photoswitchable Covalent Kinase Inhibitor

article Full Text OpenAlex

Deep learning for optical misalignment diagnostics in multi-lens imaging systems

article Full Text OpenAlex

Physics-Based Simulation of Master Template Fabrication: Integrated Modeling of Resist Coating, Electron Beam Lithography, and Reactive Ion Etching

article Full Text OpenAlex

A composite model for LELE process

article Full Text OpenAlex

近5年高被引文献
Defect and Diffusion Forum

paratext Full Text OpenAlex 544 FWCI0

Evolution in Lithography Techniques: Microlithography to Nanolithography

review Full Text OpenAlex 220 FWCI18.4352

Binding energy referencing in X-ray photoelectron spectroscopy

review Full Text OpenAlex 191 FWCI35.37

Trends in photoresist materials for extreme ultraviolet lithography: A review

review Full Text OpenAlex 165 FWCI21.8537

High-NA EUV lithography: current status and outlook for the future

article Full Text OpenAlex 159 FWCI13.9189

AWQ: Activation-aware Weight Quantization for On-Device LLM Compression and Acceleration

article Full Text OpenAlex 139 FWCI179.5284

Advances in machine learning and deep learning applications towards wafer map defect recognition and classification: a review

review Full Text OpenAlex 105 FWCI12.8491

DIC Challenge 2.0: Developing Images and Guidelines for Evaluating Accuracy and Resolution of 2D Analyses

article Full Text OpenAlex 92 FWCI8.3586

Recent developments in photoresists for extreme-ultraviolet lithography

article Full Text OpenAlex 85 FWCI11.258

Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms

article Full Text OpenAlex 84 FWCI11.1255